Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography F Torretti, J Sheil, R Schupp, MM Basko, M Bayraktar, RA Meijer, S Witte, ...
Nature communications 11 (1), 2334, 2020
82 2020 Efficient Generation of Extreme Ultraviolet Light From R Schupp, F Torretti, RA Meijer, M Bayraktar, J Scheers, D Kurilovich, ...
Physical review applied 12 (1), 014010, 2019
58 2019 Method to calculate the far field of three-dimensional objects for computer-generated holography M Bayraktar, M Özcan
Applied Optics 49 (24), 4647-4654, 2010
54 2010 Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser L Behnke, R Schupp, Z Bouza, M Bayraktar, Z Mazzotta, R Meijer, J Sheil, ...
Optics Express 29 (3), 4475-4487, 2021
37 2021 Radiation transport and scaling of optical depth in Nd: YAG laser-produced microdroplet-tin plasma R Schupp, F Torretti, RA Meijer, M Bayraktar, J Sheil, J Scheers, ...
Applied physics letters 115 (12), 2019
29 2019 High-power EUV lithography: spectral purity and imaging performance M van de Kerkhof, F Liu, M Meeuwissen, X Zhang, M Bayraktar, R de Kruif, ...
Journal of micro/nanolithography, MEMS, and MOEMS 19 (3), 033801-033801, 2020
28 2020 Digital holography image reconstruction methods M Özcan, M Bayraktar
SPIE Proceedings, 72330B, 2009
24 2009 Characterization of 1- and 2-μm-wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light R Schupp, L Behnke, J Sheil, Z Bouza, M Bayraktar, W Ubachs, ...
Physical Review Research 3, 013294, 2021
22 2021 Spectral characterization of an industrial EUV light source for nanolithography F Torretti, F Liu, M Bayraktar, J Scheers, Z Bouza, W Ubachs, R Hoekstra, ...
Journal of Physics D: Applied Physics, 2019
22 2019 Nanosheet controlled epitaxial growth of PbZr0.52Ti0.48O3 thin films on glass substrates M Bayraktar, A Chopra, F Bijkerk, G Rijnders
Applied Physics Letters 105 (13), 132904, 2014
22 2014 Ion‐Selective Ionic Polymer Metal Composite (IPMC) Actuator Based on Crown Ether Containing Sulfonated Poly (Arylene Ether Ketone) S Tas, B Zoetebier, OS Sukas, M Bayraktar, M Hempenius, GJ Vancso, ...
Macromolecular Materials and Engineering 302 (4), 2017
21 2017 Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets R Schupp, L Behnke, Z Bouza, Z Mazzotta, Y Mostafa, A Lassise, L Poirier, ...
Journal of Physics D: Applied Physics 54, 365103, 2021
18 2021 EUV Mirror Arrangement, Optical System Comprising EUV Mirror Arrangement and Method for Operating an Optical System Comprising an EUV Mirror Arrangement U Dinger, F Bijkerk, M Bayraktar, O Dier
WO Patent 2,012,126,954, 2012
15 * 2012 Tuning of large piezoelectric response in nanosheet-buffered lead zirconate titanate films on glass substrates A Chopra, M Bayraktar, M Nijland, JE Elshof, F Bijkerk, G Rijnders
Scientific Reports 7, 251, 2017
14 2017 Spectral purification and infrared light recycling in extreme ultraviolet lithography sources M Bayraktar, FA van Goor, KJ Boller, F Bijkerk
Optics Express 22 (7), 8633-8639, 2014
13 2014 EUV spectroscopy of Sn5+–Sn10+ ions in an electron beam ion trap and laser-produced plasmas Z Bouza, J Scheers, A Ryabtsev, R Schupp, L Behnke, C Shah, J Sheil, ...
Journal of Physics B: Atomic, Molecular and Optical Physics 53 (19), 195001, 2020
11 2020 Broadband transmission grating spectrometer for measuring the emission spectrum of EUV sources M Bayraktar, HMJ Bastiaens, C Bruineman, B Vratzov, F Bijkerk
NEVAC blad 54, 14-19, 2016
11 2016 Wavefront correction in the extreme ultraviolet wavelength range using piezoelectric thin films M Bayraktar, A Chopra, G Rijnders, K Boller, F Bijkerk
Optics Express 22 (25), 30623-30632, 2014
11 2014 Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths M Bayraktar, WA Wessels, CJ Lee, FA Goor, G Koster, G Rijnders, ...
Journal of Physics D: Applied physics 45, 494001, 2012
10 2012 The spectrum of a 1-µm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range Z Bouza, J Byers, J Scheers, R Schupp, Y Mostafa, L Behnke, Z Mazzotta, ...
AIP Advances 11 (12), 125003, 2021
9 2021 
Oscar O. VersolatoGroup leader and Head of Department, Advanced Research Center for Nanolithography (ARCNL)Geverifieerd e-mailadres voor arcnl.nl
