| Metrology for the next generation of semiconductor devices NG Orji, M Badaroglu, BM Barnes, C Beitia, BD Bunday, U Celano, ... Nature electronics 1 (10), 532-547, 2018 | 338 | 2018 |
| Fundamental limits of optical critical dimension metrology: a simulation study R Silver, T Germer, R Attota, BM Barnes, B Bunday, J Allgair, E Marx, ... Metrology, Inspection, and Process Control for Microlithography XXI 6518 …, 2007 | 104 | 2007 |
| Scatterfield microscopy for extending the limits of image-based optical metrology RM Silver, BM Barnes, R Attota, J Jun, M Stocker, E Marx, HJ Patrick Applied optics 46 (20), 4248-4257, 2007 | 87 | 2007 |
| Improving optical measurement accuracy using multi-technique nested uncertainties RM Silver, NF Zhang, BM Barnes, H Zhou, A Heckert, R Dixson, ... Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 50 | 2009 |
| Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization J Qin, RM Silver, BM Barnes, H Zhou, RG Dixson, MA Henn Light: Science & Applications 5 (2), e16038-e16038, 2016 | 47 | 2016 |
| Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach NF Zhang, RM Silver, H Zhou, BM Barnes Applied Optics 51 (25), 6196-6206, 2012 | 45 | 2012 |
| Three-dimensional deep sub-wavelength defect detection using λ= 193 nm optical microscopy BM Barnes, MY Sohn, F Goasmat, H Zhou, AE Vladár, RM Silver, A Arceo Optics express 21 (22), 26219-26226, 2013 | 37 | 2013 |
| Optical through-focus technique that differentiates small changes in line width, line height, and sidewall angle for CD, overlay, and defect metrology applications R Attota, R Silver, BM Barnes Metrology, Inspection, and Process Control for Microlithography XXII 6922 …, 2008 | 33 | 2008 |
| Angle resolved optical metrology RM Silver, BM Barnes, A Heckert, R Attota, R Dixson, J Jun Metrology, Inspection, and Process Control for Microlithography XXII 6922 …, 2008 | 33 | 2008 |
| Enhancing 9 nm node dense patterned defect optical inspection using polarization, angle, and focus BM Barnes, F Goasmat, MY Sohn, H Zhou, RM Silver, A Arceo Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 32 | 2013 |
| Optical critical dimension measurement of silicon grating targets using back focal plane scatterfield microscopy HJ Patrick, R Attota, BM Barnes, TA Germer, RG Dixson, MT Stocker, ... Journal of Micro/Nanolithography, MEMS and MOEMS 7 (1), 013012-013012-11, 2008 | 27 | 2008 |
| Fourier domain optical tool normalization for quantitative parametric image reconstruction J Qin, RM Silver, BM Barnes, H Zhou, F Goasmat Applied optics 52 (26), 6512-6522, 2013 | 25 | 2013 |
| Characterizing a scatterfield optical platform for semiconductor metrology BM Barnes, R Attota, R Quintanilha, YJ Sohn, RM Silver Measurement Science and Technology 22 (2), 024003, 2010 | 22 | 2010 |
| 193 nm angle-resolved scatterfield microscope for semiconductor metrology YJ Sohn, R Quintanilha, BM Barnes, RM Silver Instrumentation, Metrology, and Standards for Nanomanufacturing III 7405 …, 2009 | 22 | 2009 |
| Scatterfield microscopy of 22-nm node patterned defects using visible and DUV light BM Barnes, YJ Sohn, F Goasmat, H Zhou, RM Silver, A Arceo Metrology, Inspection, and Process Control for Microlithography XXVI 8324 …, 2012 | 21 | 2012 |
| Köhler illumination for high-resolution optical metrology YJ Sohn, BM Barnes, L Howard, RM Silver, R Attota, MT Stocker Metrology, Inspection, and Process Control for Microlithography XX 6152 …, 2006 | 21 | 2006 |
| Proton–carbon monoxide collisions from 10 keV to 14 MeV E Wells, V Krishnamurthi, KD Carnes, NG Johnson, HD Baxter, D Moore, ... Physical Review A 72 (2), 022726, 2005 | 21 | 2005 |
| Zero-order imaging of device-sized overlay targets using scatterfield microscopy BM Barnes, LP Howard, J Jun, P Lipscomb, RM Silver Metrology, Inspection, and Process Control for Microlithography XXI 6518 …, 2007 | 20 | 2007 |
| The limits and extensibility of optical patterned defect inspection RM Silver, BM Barnes, Y Sohn, R Quintanilha, H Zhou, C Deeb, ... Metrology, Inspection, and Process Control for Microlithography XXIV 7638 …, 2010 | 19 | 2010 |
| Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression MA Henn, RM Silver, JS Villarrubia, NF Zhang, H Zhou, BM Barnes, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (4), 044001, 2015 | 17 | 2015 |
