A real-time evaluation of energy management systems for smart hybrid home Microgrids M Marzband, SS Ghazimirsaeid, H Uppal, T Fernando Electric Power Systems Research 143, 624-633, 2017 | 184 | 2017 |
Optimal energy management system based on stochastic approach for a home Microgrid with integrated responsive load demand and energy storage M Marzband, H Alavi, SS Ghazimirsaeid, H Uppal, T Fernando Sustainable cities and society 28, 256-264, 2017 | 167 | 2017 |
Dielectric breakdown in chemical vapor deposited hexagonal boron nitride L Jiang, Y Shi, F Hui, K Tang, Q Wu, C Pan, X Jing, H Uppal, F Palumbo, ... ACS applied materials & interfaces 9 (45), 39758-39770, 2017 | 52 | 2017 |
Breakdown and degradation of ultrathin Hf-based (HfO2) x (SiO2) 1− x gate oxide films HJ Uppal, IZ Mitrovic, S Hall, B Hamilton, V Markevich, AR Peaker Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 26 | 2009 |
Reliability nano-characterization of thin SiO2 and HfSixOy/SiO2 gate stacks E Efthymiou, S Bernardini, SN Volkos, B Hamilton, JF Zhang, HJ Uppal, ... Microelectronic engineering 84 (9-10), 2290-2293, 2007 | 18 | 2007 |
Smart integrated adaptive centralized controller for islanded microgrids under minimized load shedding M Karimi, R Azizipanah-Abarghooee, H Uppal, Q Hong, C Booth, ... 2017 5th International Istanbul Smart Grid and Cities Congress and Fair …, 2017 | 16 | 2017 |
Dynamic behavior of multi-carrier energy market in view of investment incentives J Valinejad, M Marzband, Y Xu, H Uppal, A Saad Al-Sumaiti, T Barforoshi Electrical Engineering 101, 1033-1051, 2019 | 11 | 2019 |
An investigation on using electrical resistance tomography (ERT) to monitor the removal of a non-Newtonian soil by water from a cleaning-in-place (CIP) circuit containing … R Hou, PJ Martin, HJ Uppal, AJ Kowalski Chemical Engineering Research and Design 111, 332-341, 2016 | 10 | 2016 |
A power hardware-in-the-loop simulation facility for testing grid-connected storage systems R Todd, HJ Uppal, T Feehally, AJ Forsyth, AM Pavan 2019 IEEE Power & Energy Society Innovative Smart Grid Technologies …, 2019 | 7 | 2019 |
Nanoscale electrical characterization of ultrathin high-k dielectric MOS stacks: A conducting AFM study HJ Uppal, S Bernardini, E Efthymiou, SN Volkos, A Dimoulas, ... Materials science in semiconductor processing 11 (5-6), 250-253, 2008 | 4 | 2008 |
Post-stress/breakdown leakage mechanism in ultrathin high-κ (HfO2) x (SiO2) 1-x/SiO2 gate stacks: A nanoscale conductive-Atomic Force Microscopy C-AFM HJ Uppal, V Markevich, SN Volkos, A Dimoulas, B Hamilton, AR Peaker MRS Online Proceedings Library (OPL) 1108, 1108-A10-06, 2008 | 1 | 2008 |
Nanoscale localized current transport mechanism in ultrathin ALD high-κ HfO2/SiOx-CL/Ge gate stacks: conductive-Atomic Force Microscopy C-AFM HJU H. Grampeix, C. Le Loyer, M. Houssa, V. Markevich, A. Dimoulas, S. N ... to be submitted for Journal of Applied Physics, 2016 | | 2016 |
Electrical Reliability Characterization under Nanoscale Degradation and Breakdown in Ultrathin HfO2/SiO2 and ZrO2/GeO2 high-κ integrated MOS gate stacks: by Conductive-Atomic … HJU E. Whittaker, V. Markevich, A. Dimoulas, S. N. Volkos, B. Hamilton, A. R ... to be submitted for Journal of Applied Physics, 2016 | | 2016 |
Transients of Pre-Stress Ramp Voltage Stress RVS and Post-stress Constant Voltage Stress CVS Imaging on the Electrical Degradation of Ultrathin HfSixOy/SiO2 MOS stacks: a … HJU E. Whittaker, V. Markevich, A. R. Peaker, B. Hamilton to be submitted for Journal of Applied Physics, 2016 | | 2016 |
Post-stress/breakdown leakage mechanism in ultrathin high-?(HfO2) x (SiO2) 1-x/SiO2 gate stacks: a nanoscale conductive-atomic force microscopy C-AFM HJ Uppal, SN Volkos, A Dimoulas, B Hamilton, AR Peaker Materials Research Society, 2009 | | 2009 |
Nanoscale Performance, Degradation and Defect Analysis of MOS Devices Using High-κ Dielectric Materials as Gate Stacks by Atomic Force Microscopy. HJ Uppal PQDT-Global, 2009 | | 2009 |
Nanoscale performance, degradation and defect analysis of mos devices using high-k dielectric materials as gate stacks by atomic force microscopy HJ Uppal The University of Manchester, 2009 | | 2009 |
Non–homogeneous lateral propagation of leakage and degradation: a phenomenology in ultrathin multilayered high-κ [(HfO 2) x (SiO x)/SiO x] gate stacks Non–homogeneous lateral … HJ Uppal, V Markevich, E Wittacker, AR Peaker, B Hamilton, SN Volkos, ... | | |
Interface control, inhomogeneity and instability analysis of ultrathin High–κ/GeO x/Ge and High-κ/SiO x-CL/Ge gate stacks: under Conductive Atomic Force Microscopy HJ Uppal, E Whittaker, V Markevich, AR Peaker, B Hamilton, SN Volkos, ... | | |
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