Alexey Kovalgin
Alexey Kovalgin
Associate Professor, University of Twente, Enschede, NL
Verified email at utwente.nl
Title
Cited by
Cited by
Year
CO interaction with the surface of thermally activated CaO and MgO
MA Babaeva, DS Bystrov, AY Kovalgin, AA Tsyganenko
Journal of Catalysis 123 (2), 396-416, 1990
1131990
Semiconductor processing apparatus with compact free radical source
AY Kovalgin, AAI Aarnink
US Patent App. 13/918,094, 2013
1072013
Selective deposition of tungsten
AY Kovalgin, M Yang, AAI Aarnink, RAM Wolters
US Patent App. 15/615,489, 2018
882018
Systematic TLM measurements of NiSi and PtSi specific contact resistance to n-and p-type Si in a broad doping range
N Stavitski, MJH Van Dal, A Lauwers, C Vrancken, AY Kovalgin, ...
IEEE electron device letters 29 (4), 378-381, 2008
872008
Growth kinetics and oxidation mechanism of ALD TiN thin films monitored by in situ spectroscopic ellipsometry
H Van Bui, AW Groenland, AAI Aarnink, RAM Wolters, J Schmitz, ...
Journal of the Electrochemical Society 158 (3), H214, 2011
572011
Cross-bridge Kelvin resistor structures for reliable measurement of low contact resistances and contact interface characterization
N Stavitski, JH Klootwijk, HW van Zeijl, AY Kovalgin, RAM Wolters
IEEE transactions on semiconductor manufacturing 22 (1), 146-152, 2009
522009
Initial growth, refractive index, and crystallinity of thermal and plasma-enhanced atomic layer deposition AlN films
H Van Bui, FB Wiggers, A Gupta, MD Nguyen, AAI Aarnink, MP de Jong, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 33 (1 …, 2015
412015
On the difference between optically and electrically determined resistivity of ultra-thin titanium nitride films
H Van Bui, AY Kovalgin, RAM Wolters
Applied surface science 269, 45-49, 2013
382013
Self-limiting growth and thickness-and temperature-dependence of optical constants of ALD AlN thin films
H Van Bui, MD Nguyen, FB Wiggers, AAI Aarnink, MP de Jong, ...
ECS journal of solid state science and technology 3 (4), P101, 2014
282014
Evaluation of transmission line model structures for silicide-to-silicon specific contact resistance extraction
N Stavitski, MJH van Dal, A Lauwers, C Vrancken, AY Kovalgin, ...
IEEE transactions on electron devices 55 (5), 1170-1176, 2008
282008
Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD
A Boogaard, AY Kovalgin, I Brunets, AAI Aarnink, J Holleman, ...
Surface and coatings technology 201 (22-23), 8976-8980, 2007
272007
Low-temperature LPCVD of Si nanocrystals from disilane and trisilane (SilcoreŽ) embedded in ALD-alumina for non-volatile memory devices
I Brunets, AAI Aarnink, A Boogaard, AY Kovalgin, RAM Wolters, ...
Surface and coatings technology 201 (22-23), 9209-9214, 2007
262007
Integration of solar cells on top of CMOS chips part I: A-Si solar cells
J Lu, AY Kovalgin, KHM van der Werf, REI Schropp, J Schmitz
IEEE transactions on electron devices 58 (7), 2014-2021, 2011
252011
Interaction of epitaxial silicene with overlayers formed by exposure to Al atoms and O2 molecules
R Friedlein, H Van Bui, FB Wiggers, Y Yamada-Takamura, AY Kovalgin, ...
The Journal of chemical physics 140 (20), 204705, 2014
242014
Hot‐Wire Assisted ALD: A Study Powered by In Situ Spectroscopic Ellipsometry
AY Kovalgin, M Yang, S Banerjee, RO Apaydin, AAI Aarnink, S Kinge, ...
Advanced materials interfaces 4 (18), 1700058, 2017
232017
Chemical modeling of a high-density inductively-coupled plasma reactor containing silane
AY Kovalgin, A Boogaard, I Brunets, J Holleman, J Schmitz
Surface and coatings technology 201 (22-23), 8849-8853, 2007
232007
Net negative charge in low-temperature SiO2 gate dielectric layers
A Boogaard, AY Kovalgin, RAM Wolters
Microelectronic engineering 86 (7-9), 1707-1710, 2009
222009
From Single Atoms to Nanoparticles: Autocatalysis and Metal Aggregation in Atomic Layer Deposition of Pt on TiO2 Nanopowder
F Grillo, H Van Bui, D La Zara, AAI Aarnink, AY Kovalgin, P Kooyman, ...
Small 14 (23), 1800765, 2018
212018
Replication molds having nanometer-scale shape control fabricated by means of oxidation and etching
GM Kim, A Kovalgin, J Holleman, J Brugger
Journal of nanoscience and nanotechnology 2 (1), 55-59, 2002
212002
Low-temperature fabricated TFTs on polysilicon stripes
I Brunets, J Holleman, AY Kovalgin, A Boogaard, J Schmitz
IEEE transactions on electron devices 56 (8), 1637-1644, 2009
202009
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