Shaunak Mukherjee
Shaunak Mukherjee
Verified email at amat.com
Title
Cited by
Cited by
Year
Hot Electrons Do the Impossible: Plasmon-Induced Dissociation of H2 on Au
S Mukherjee, F Libisch, N Large, O Neumann, LV Brown, J Cheng, ...
Nano letters 13 (1), 240-247, 2013
11032013
Aluminum Plasmonic Nanoantennas
H Everitt, M Knight, L Liu, Y Yang, L Brown, S Mukherjee, N King, ...
APS Meeting Abstracts, 2013
513*2013
Aluminum plasmonic nanoantennas
MW Knight, L Liu, Y Wang, L Brown, S Mukherjee, NS King, HO Everitt, ...
Nano letters 12 (11), 6000-6004, 2012
5132012
Hot-Electron-Induced Dissociation of H2 on Gold Nanoparticles Supported on SiO2
S Mukherjee, L Zhou, AM Goodman, N Large, C Ayala-Orozco, Y Zhang, ...
Journal of the American Chemical Society 136 (1), 64-67, 2013
3672013
Fanoshells: nanoparticles with built-in Fano resonances
S Mukherjee, H Sobhani, JB Lassiter, R Bardhan, P Nordlander, NJ Halas
Nano letters 10 (7), 2694-2701, 2010
3282010
Au nanomatryoshkas as efficient near-infrared photothermal transducers for cancer treatment: benchmarking against nanoshells
C Ayala-Orozco, C Urban, MW Knight, AS Urban, O Neumann, ...
ACS nano 8 (6), 6372-6381, 2014
2982014
Nanosphere-in-a-Nanoshell: A Simple Nanomatryushka
R Bardhan*, S Mukherjee*, NA Mirin, SD Levit, P Nordlander, NJ Halas
The Journal of Physical Chemistry C 114 (16), 7378-7383, 2009
2402009
Magnetic plasmon formation and propagation in artificial aromatic molecules
N Li*u, S Mukherjee*, K Bao*, LV Brown, J Dorfmüller, P Nordlander, ...
Nano letters 12 (1), 364-369, 2011
1242011
Manipulating magnetic plasmon propagation in metallic nanocluster networks
N Liu*, S Mukherjee*, K Bao*, Y Li, LV Brown, P Nordlander, NJ Halas
ACS nano 6 (6), 5482-5488, 2012
1012012
Integrated pre-clean and deposition of low-damage layers
Y Chen, S Mukherjee, MJ Seamons, K Chan, AB Mallick, BH Kim, J Zhou, ...
US Patent 20,160,017,487, 2016
62016
Selectively lateral growth of silicon oxide thin film
Y Chen, K Chan, S Mukherjee, AB Mallick
US Patent 9,508,545, 2016
52016
Radiacal Assisted Cure Of Dielectric Films
Y Chen, S Mukherjee, K Chan, AB Mallick, Applied Materials, Inc.
US Patent 20,160,138,161, 2016
32016
High deposition rate and high quality nitride
X Han, D Padhi, M Ogata, Y Zhang, S Mukherjee
US Patent 10,790,140, 2020
22020
Selectively lateral growth of silicon oxide thin film
Y Chen, K Chan, S Mukherjee, AB Mallick
US Patent 9,741,558, 2017
12017
Plasma-enhanced and radical-based cvd of porous carbon-doped oxide films assisted by radical curing
Y Chen, K Chan, MJ Seamons, S Mukherjee, AB Mallick, J Zhou, KS Yim, ...
US Patent 20,160,017,495, 2016
12016
Enabling radical-based deposition of dielectric films
Y Chen, S Mukherjee, A Chatterjee, P Manna, AB Mallick, N Liu, J Zhou, ...
US Patent App. 14/270,216, 2015
12015
Engineered plasmonic nanostructures: Fano resonance response, magnetic plasmon resonance for waveguiding and hot electron induced photochemistry
S Mukherjee
12013
Low-K Dielectric With Self-Forming Barrier Layer
Y Ding, S Mukherjee, BO Xie, KS Yim, D Padhi
US Patent App. 16/895,541, 2020
2020
High aspect ratio deposition
S Mukherjee, AB Mallick
US Patent App. 16/648,209, 2020
2020
Non-uv high hardness low k film deposition
S MUKHERJEE, BO Xie, KM CHO, KS Yim, D Padhi, G Astha
US Patent App. 16/552,294, 2020
2020
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