| Two‐Dimensional Nanocrystals Produced by Exfoliation of Ti3AlC2 M Naguib, M Kurtoglu, V Presser, J Lu, J Niu, M Heon, L Hultman, ... Advanced materials 23 (37), 4248-4253, 2011 | 3148 | 2011 |
| Two-dimensional transition metal carbides M Naguib, O Mashtalir, J Carle, V Presser, J Lu, L Hultman, Y Gogotsi, ... ACS nano 6 (2), 1322-1331, 2012 | 1803 | 2012 |
| Microstructural evolution during film growth I Petrov, PB Barna, L Hultman, JE Greene Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (5 …, 2003 | 1644 | 2003 |
| Microstructural design of hard coatings PH Mayrhofer, C Mitterer, L Hultman, H Clemens Progress in materials science 51 (8), 1032-1114, 2006 | 958 | 2006 |
| New two-dimensional niobium and vanadium carbides as promising materials for Li-ion batteries M Naguib, J Halim, J Lu, KM Cook, L Hultman, Y Gogotsi, MW Barsoum Journal of the American Chemical Society 135 (43), 15966-15969, 2013 | 952 | 2013 |
| The Mn+ 1AXn phases: Materials science and thin-film processing P Eklund, M Beckers, U Jansson, H Högberg, L Hultman Thin Solid Films 518 (8), 1851-1878, 2010 | 843 | 2010 |
| Two-dimensional, ordered, double transition metals carbides (MXenes) B Anasori, Y Xie, M Beidaghi, J Lu, BC Hosler, L Hultman, PRC Kent, ... ACS nano 9 (10), 9507-9516, 2015 | 638 | 2015 |
| Thermal stability of nitride thin films L Hultman Vacuum 57 (1), 1-30, 2000 | 637 | 2000 |
| Self-organized nanostructures in the Ti–Al–N system PH Mayrhofer, A Hörling, L Karlsson, J Sjölén, T Larsson, C Mitterer, ... Applied Physics Letters 83 (10), 2049-2051, 2003 | 563 | 2003 |
| Transparent conductive two-dimensional titanium carbide epitaxial thin films J Halim, MR Lukatskaya, KM Cook, J Lu, CR Smith, LÅ Näslund, SJ May, ... Chemistry of Materials 26 (7), 2374-2381, 2014 | 541 | 2014 |
| Mechanical properties and machining performance of Ti1− xAlxN-coated cutting tools A Hörling, L Hultman, M Odén, J Sjölén, L Karlsson Surface and Coatings Technology 191 (2-3), 384-392, 2005 | 532 | 2005 |
| Role of nitrogen in the formation of hard and elastic CN x thin films by reactive magnetron sputtering N Hellgren, MP Johansson, E Broitman, L Hultman, JE Sundgren Physical Review B 59 (7), 5162, 1999 | 500 | 1999 |
| Growth, structure, and microhardness of epitaxial TiN/NbN superlattices M Shinn, L Hultman, SA Barnett Journal of Materials Research 7 (4), 901-911, 1992 | 468 | 1992 |
| Development of preferred orientation in polycrystalline TiN layers grown by ultrahigh vacuum reactive magnetron sputtering JE Greene, JE Sundgren, L Hultman, I Petrov, DB Bergstrom Applied physics letters 67 (20), 2928-2930, 1995 | 364 | 1995 |
| Influence of high power densities on the composition of pulsed magnetron plasmas AP Ehiasarian, R New, WD Münz, L Hultman, U Helmersson, ... Vacuum 65 (2), 147-154, 2002 | 333 | 2002 |
| Thermal stability of arc evaporated high aluminum-content thin films A Hörling, L Hultman, M Odén, J Sjölén, L Karlsson Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (5 …, 2002 | 331 | 2002 |
| Microstructure modification of TiN by ion bombardment during reactive sputter deposition I Petrov, L Hultman, U Helmersson, JE Sundgren, JE Greene Thin Solid Films 169 (2), 299-314, 1989 | 322 | 1989 |
| Epitaxially grown graphene based gas sensors for ultra sensitive NO2 detection R Pearce, T Iakimov, M Andersson, L Hultman, AL Spetz, R Yakimova Sensors and Actuators B: Chemical 155 (2), 451-455, 2011 | 314 | 2011 |
| Crystallization of amorphous silicon during thin‐film gold reaction L Hultman, A Robertsson, HTG Hentzell, I Engström, PA Psaras Journal of applied physics 62 (9), 3647-3655, 1987 | 296 | 1987 |
| High‐flux low‐energy (≂20 eV) N+2 ion irradiation during TiN deposition by reactive magnetron sputtering: Effects on microstructure and preferred orientation L Hultman, JE Sundgren, JE Greene, DB Bergstrom, I Petrov Journal of Applied Physics 78 (9), 5395-5403, 1995 | 250 | 1995 |
Joe GreeneProfessor of Materials Science and Physics, University of IllinoisVerified email at uiuc.edu
