Chris Kleijn
Chris Kleijn
professor Transport Phenomena, Chemical Engineering, Delft University of Technology
Verified email at tudelft.nl
TitleCited byYear
Inertial and interfacial effects on pressure drop of Taylor flow in capillaries
MT Kreutzer, F Kapteijn, JA Moulijn, CR Kleijn, JJ Heiszwolf
AIChE Journal 51 (9), 2428-2440, 2005
3252005
μ-PIV study of the formation of segmented flow in microfluidic T-junctions
V van Steijn, MT Kreutzer, CR Kleijn
Chemical Engineering Science 62 (24), 7505-7514, 2007
2552007
Predictive model for the size of bubbles and droplets created in microfluidic T-junctions
V van Steijn, CR Kleijn, MT Kreutzer
Lab on a Chip 10 (19), 2513-2518, 2010
2272010
A mathematical model of the hydrodynamics and gas‐phase reactions in silicon LPCVD in a single‐wafer reactor
CR Kleijn
Journal of the Electrochemical Society 138 (7), 2190-2200, 1991
1331991
Benchmark numerical simulations of segmented two-phase flows in microchannels using the Volume of Fluid method
DA Hoang, V van Steijn, LM Portela, MT Kreutzer, CR Kleijn
Computers & Fluids 86, 28-36, 2013
1322013
Return flows in horizontal MOCVD reactors studied with the use of TiO2 particle injection and numerical calculations
EP Visser, CR Kleijn, CAM Govers, CJ Hoogendoorn, LJ Giling
Journal of Crystal Growth 94 (4), 929-946, 1989
1251989
Flows around confined bubbles and their importance in triggering pinch-off
V van Steijn, CR Kleijn, MT Kreutzer
Physical review letters 103 (21), 214501, 2009
1192009
Computational modeling of transport phenomena and detailed chemistry in chemical vapor deposition–a benchmark solution
CR Kleijn
Thin Solid Films 365 (2), 294-306, 2000
1132000
Optimizing transport in nanostructured catalysts: a computational study
G Wang, E Johannessen, CR Kleijn, SW de Leeuw, MO Coppens
Chemical Engineering Science 62 (18-20), 5110-5116, 2007
922007
A mathematical model for LPCVD in a single wafer reactor
CR Kleijn, TH Van Der Meer, CJ Hoogendoorn
Journal of The Electrochemical Society 136 (11), 3423-3433, 1989
921989
Modeling and optimization of the step coverage of tungsten LPCVD in trenches and contact holes
A Hasper, J Holleman, J Middelhoek, CR Kleijn, CJ Hoogendoorn
Journal of the Electrochemical Society 138 (6), 1728-1738, 1991
891991
A study of 2-and 3-D transport phenomena in horizontal chemical vapor deposition reactors
CR Kleijn, CJ Hoogendoorn
Chemical Engineering Science 46 (1), 321-334, 1991
781991
Multi-scale modeling of chemical vapor deposition processes for thin film technology
CR Kleijn, R Dorsman, KJ Kuijlaars, M Okkerse, H van Santen
Journal of crystal growth 303 (1), 362-380, 2007
772007
Computational simulations of magnetic particle capture in arterial flows
JW Haverkort, S Kenjereš, CR Kleijn
Annals of biomedical engineering 37 (12), 2436, 2009
752009
Dynamics of droplet breakup in a T-junction
DA Hoang, LM Portela, CR Kleijn, MT Kreutzer, V Van Steijn
Journal of Fluid Mechanics 717, 2013
722013
Chemical vapor deposition processes
CR Kleijn
Computational modeling in semiconductor processing, 1995
701995
Transport Phenomena in Tungsten LPCVD in a Single‐Wafer Reactor
CR Kleijn, CJ Hoogendoorn, A Hasper, J Holleman, J Middelhoek
Journal of the Electrochemical Society 138 (2), 509-517, 1991
701991
Velocity fluctuations of segmented flow in microchannels
V Van Steijn, MT Kreutzer, CR Kleijn
Chemical Engineering Journal 135, S159-S165, 2008
662008
Hydraulic permeability of ordered and disordered single-layer arrays of cylinders
MP Sobera, CR Kleijn
Physical Review E 74 (3), 036301, 2006
612006
The effect of oxygen on transitional Marangoni flow in laser spot welding
CX Zhao, C Kwakernaak, Y Pan, IM Richardson, Z Saldi, S Kenjeres, ...
Acta Materialia 58 (19), 6345-6357, 2010
602010
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