Sonia Castellanos
Sonia Castellanos
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Co@ NH 2-MIL-125 (Ti): cobaloxime-derived metal–organic framework-based composite for light-driven H 2 production
MA Nasalevich, R Becker, EV Ramos-Fernandez, S Castellanos, ...
Energy & Environmental Science 8 (1), 364-375, 2015
Multi-scale crystal engineering of metal organic frameworks
B Seoane, S Castellanos, A Dikhtiarenko, F Kapteijn, J Gascon
Coordination Chemistry Reviews 307, 147-187, 2016
Red organic light-emitting radical adducts of carbazole and tris (2, 4, 6-trichlorotriphenyl) methyl radical that exhibit high thermal stability and electrochemical amphotericity
D Velasco, S Castellanos, M López, F López-Calahorra, E Brillas, L Juliá
The Journal of Organic Chemistry 72 (20), 7523-7532, 2007
Photoswitchable metal organic frameworks: turn on the lights and close the windows
S Castellanos, F Kapteijn, J Gascon
CrystEngComm 18 (22), 4006-4012, 2016
Organic linker defines the excited‐state decay of photocatalytic MIL‐125 (Ti)‐type materials
JG Santaclara, MA Nasalevich, S Castellanos, WH Evers, FCM Spoor, ...
ChemSusChem 9 (4), 388-395, 2016
Structural Effects in Visible‐Light‐Responsive Metal–Organic Frameworks Incorporating ortho‐Fluoroazobenzenes
S Castellanos, A Goulet‐Hanssens, F Zhao, A Dikhtiarenko, ...
Chemistry–A European Journal 22 (2), 746-752, 2016
Taking advantage of the radical character of tris (2, 4, 6-trichlorophenyl) methyl to synthesize new paramagnetic glassy molecular materials
S Castellanos, D Velasco, F López-Calahorra, E Brillas, L Julia
The Journal of Organic Chemistry 73 (10), 3759-3767, 2008
Key role of very low energy electrons in tin-based molecular resists for extreme ultraviolet nanolithography
I Bespalov, Y Zhang, J Haitjema, RM Tromp, SJ van der Molen, ...
ACS applied materials & interfaces 12 (8), 9881-9889, 2020
Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
R Fallica, J Haitjema, L Wu, S Castellanos, AM Brouwer, Y Ekinci
Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (2), 023505-023505, 2018
Gating charge recombination rates through dynamic bridges in tetrathiafulvalene–fullerene architectures
S Castellanos, AA Vieira, BM Illescas, V Sacchetti, C Schubert, J Moreno, ...
Angewandte Chemie International Edition 52 (52), 13985-13990, 2013
Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy
Y Zhang, J Haitjema, X Liu, F Johansson, A Lindblad, S Castellanos, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 16 (2), 023510-023510, 2017
All‐Organic Discotic Radical with a Spin‐Carrying Rigid‐Core Showing Intracolumnar Interactions and Multifunctional Properties
S Castellanos, F López‐Calahorra, E Brillas, L Juliá, D Velasco
Angewandte Chemie 121 (35), 6638-6641, 2009
Universal direct patterning of colloidal quantum dots by (extreme) ultraviolet and electron beam lithography
CD Dieleman, W Ding, L Wu, N Thakur, I Bespalov, B Daiber, Y Ekinci, ...
Nanoscale 12 (20), 11306-11316, 2020
Stable radical cores: a key for bipolar charge transport in glass forming carbazole and indole derivatives
S Castellanos, V Gaidelis, V Jankauskas, JV Grazulevicius, E Brillas, ...
Chemical communications 46 (28), 5130-5132, 2010
Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters
N Thakur, LT Tseng, M Vockenhuber, Y Ekinci, S Castellanos
Journal of Micro/Nanolithography, MEMS, and MOEMS 18 (4), 043504-043504, 2019
Mechanistic insights in Zr-and Hf-based molecular hybrid EUV photoresists
L Wu, M Baljozovic, G Portale, D Kazazis, M Vockenhuber, T Jung, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 18 (1), 013504-013504, 2019
Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
S Castellanos, L Wu, M Baljozovic, G Portale, D Kazazis, M Vockenhuber, ...
Extreme Ultraviolet (EUV) Lithography IX 10583, 58-69, 2018
Illuminating the nature and behavior of the active center: the key for photocatalytic H 2 production in Co@ NH 2-MIL-125 (Ti)
A Iglesias-Juez, S Castellanos, M Monte, G Agostini, D Osadchii, ...
Journal of Materials Chemistry A 6 (36), 17318-17322, 2018
Absorption coefficient and exposure kinetics of photoresists at EUV
R Fallica, J Haitjema, L Wu, S Castellanos, F Brouwer, Y Ekinci
Extreme Ultraviolet (EUV) Lithography VIII 10143, 29-39, 2017
Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications
L Wu, M Tiekink, A Giuliani, L Nahon, S Castellanos
Journal of Materials Chemistry C 7 (1), 33-37, 2019
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