Raphael Ramos
Raphael Ramos
researcher, CEA LITEN (Grenoble)
Geverifieerd e-mailadres voor cea.fr
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New chamber walls conditioning and cleaning strategies to improve the stability of plasma processes
G Cunge, B Pelissier, O Joubert, R Ramos, C Maurice
Plasma Sources Science and Technology 14 (3), 599, 2005
872005
Etching mechanisms of , , and poly-Si substrates in plasmas
E Sungauer, E Pargon, X Mellhaoui, R Ramos, G Cunge, L Vallier, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007
592007
No cytotoxicity or genotoxicity of graphene and graphene oxide in murine lung epithelial FE1 cells in vitro
S Bengtson, K Kling, AM Madsen, AW Noergaard, NR Jacobsen, ...
Environmental and molecular mutagenesis 57 (6), 469-482, 2016
532016
Radical surface interactions in industrial silicon plasma etch reactors
G Cunge, D Vempaire, R Ramos, M Touzeau, O Joubert, P Bodard, ...
Plasma Sources Science and Technology 19 (3), 034017, 2010
502010
Cleaning aluminum fluoride coatings from plasma reactor walls in SiCl4/Cl2 plasmas
R Ramos, G Cunge, B Pelissier, O Joubert
Plasma Sources Science and Technology 16 (4), 711, 2007
442007
Enhanced ionic liquid mobility induced by confinement in 1D CNT membranes
Q Berrod, F Ferdeghini, P Judeinstein, N Genevaz, R Ramos, A Fournier, ...
Nanoscale 8 (15), 7845-7848, 2016
412016
Gas temperature measurement in , , , , and HBr inductively coupled plasmas
G Cunge, R Ramos, D Vempaire, M Touzeau, M Neijbauer, N Sadeghi
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 27 (3 …, 2009
412009
Influence of the reactor wall composition on radicals’ densities and total pressure in inductively coupled plasmas: II. During silicon etching
G Cunge, N Sadeghi, R Ramos
Journal of Applied Physics 102 (9), 093305, 2007
392007
Influence of the reactor wall composition on radicals' densities and total pressure in inductively coupled plasmas: I. Without silicon etching
G Cunge, N Sadeghi, R Ramos
Journal of Applied Physics 102 (9), 093304, 2007
382007
Plasma/reactor walls interactions in advanced gate etching processes
R Ramos, G Cunge, O Joubert, N Sadeghi, M Mori, L Vallier
Thin Solid Films 515 (12), 4846-4852, 2007
342007
Vertically-aligned carbon nanotubes on aluminum as a light-weight positive electrode for lithium-polysulfide batteries
S Liatard, K Benhamouda, A Fournier, R Ramos, C Barchasz, J Dijon
Chemical communications 51 (36), 7749-7752, 2015
252015
A survey of carbon nanotube interconnects for energy efficient integrated circuits
A Todri-Sanial, R Ramos, H Okuno, J Dijon, A Dhavamani, M Widlicenus, ...
IEEE Circuits and Systems Magazine 17 (2), 47-62, 2017
242017
Near-field artifacts in tip-enhanced Raman spectroscopy
R Ramos, MJ Gordon
Applied Physics Letters 100 (21), 213111, 2012
202012
Absorption spectroscopy in BCl3 inductively coupled plasmas: determination of density, rotational, translational and vibrational temperatures of BCl molecule
R Ramos, G Cunge, M Touzeau, N Sadeghi
Journal of Physics D: Applied Physics 41 (11), 115205, 2008
182008
On the interest of carbon-coated plasma reactor for advanced gate stack etching processes
R Ramos, G Cunge, O Joubert
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 25 (2 …, 2007
182007
Measured velocity distribution of sputtered Al atoms perpendicular and parallel to the target
R Ramos, G Cunge, M Touzeau, N Sadeghi
Journal of Physics D: Applied Physics 41 (15), 152003, 2008
172008
Plasma reactor dry cleaning strategy after TiN, TaN and etching processes
R Ramos, G Cunge, O Joubert
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008
162008
High-yield, in-situ fabrication and integration of horizontal carbon nanotube arrays at the wafer scale for robust ammonia sensors
H Guerin, H Le Poche, R Pohle, LS Bernard, E Buitrago, R Ramos, ...
Carbon 78, 326-338, 2014
152014
Revisiting the mechanisms involved in Line Width Roughness smoothing of 193 nm photoresist patterns during HBr plasma treatment
M Brihoum, R Ramos, K Menguelti, G Cunge, E Pargon, O Joubert
Journal of Applied Physics 113 (1), 013302, 2013
142013
Plasma treatments to improve line-width roughness during gate patterning
LM Azarnouche, E Pargon, K Menguelti, M Fouchier, M Brihoum, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (4), 041304, 2013
112013
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