Pieter Kruit
Cited by
Cited by
Magnetic field paralleliser for 2π electron-spectrometer and electron-image magnifier
P Kruit, FH Read
Journal of Physics E: Scientific Instruments 16 (4), 313, 1983
Electron spectra from multiphoton ionization of xenon at 1064, 532, and 355 nm
P Kruit, J Kimman, HG Muller, MJ Van der Wiel
Physical Review A 28 (1), 248, 1983
Approaching the resolution limit of nanometer-scale electron beam-induced deposition
WF Van Dorp, B Van Someren, CW Hagen, P Kruit, PA Crozier
Nano letters 5 (7), 1303-1307, 2005
Field emission energy distributions from individual multiwalled carbon nanotubes
MJ Fransen, TL Van Rooy, P Kruit
Applied surface science 146 (1-4), 312-327, 1999
Absorption of additional photons in the multiphoton ionisation continuum of xenon at 1064, 532 and 440 nm
P Kruit, J Kimman, MJ Van der Wiel
Journal of Physics B: Atomic and Molecular Physics 14 (19), L597, 1981
Addition of different contributions to the charged particle probe size
JE Barth, P Kruit
Optik (Stuttgart) 101 (3), 101-109, 1996
10 nm lines and spaces written in HSQ, using electron beam lithography
AE Grigorescu, MC Van der Krogt, CW Hagen, P Kruit
Microelectronic Engineering 84 (5-8), 822-824, 2007
Direct fabrication of nanowires in an electron microscope
N Silvis-Cividjian, CW Hagen, P Kruit, MAJ vd Stam, HB Groen
Applied Physics Letters 82 (20), 3514-3516, 2003
The role of secondary electrons in electron-beam-induced-deposition spatial resolution
N Silvis-Cividjian, CW Hagen, LHA Leunissen, P Kruit
Microelectronic engineering 61, 693-699, 2002
Quantitative data processing of parallel recorded electron energy‐loss spectra with low signal to background
H Shuman, P Kruit
Review of scientific instruments 56 (2), 231-239, 1985
Spatial resolution limits in electron-beam-induced deposition
N Silvis-Cividjian, CW Hagen, P Kruit
Journal of Applied Physics 98 (8), 084905, 2005
Resonantly enhanced multiphoton ionization of xenon: photoelectron enrgy analysis
RN Compton, JC Miller, AE Carter, P Kruit
Chemical Physics Letters 71 (1), 87-90, 1980
Simultaneous correlative scanning electron and high-NA fluorescence microscopy
N Liv, AC Zonnevylle, AC Narvaez, APJ Effting, PW Voorneveld, ...
PloS one 8 (2), e55707, 2013
Electron beam exposure system
MJ Wieland, BJ Kampherbeek, AHV Van Veen, P Kruit
US Patent 6,897,458, 2005
Apparatus for generating a plurality of beamlets
P Kruit
US Patent 7,129,502, 2006
Designs for a quantum electron microscope
P Kruit, RG Hobbs, CS Kim, Y Yang, VR Manfrinato, J Hammer, S Thomas, ...
Ultramicroscopy 164, 31-45, 2016
Lithography system
JJM Wieland, JC Van't Spijker, R Jager, P Kruit
US Patent 6,958,804, 2005
Construction and characterization of the fringe field monochromator for a field emission gun
HW Mook, P Kruit
Ultramicroscopy 81 (3-4), 129-139, 2000
Highly resolved electron spectra for resonantly enhanced four-photon ionization of no
J Kimman, P Kruit, MJ Van der Wiel
Chemical Physics Letters 88 (6), 576-580, 1982
Integration of a high‐NA light microscope in a scanning electron microscope
AC Zonnevylle, RFC Van Tol, N Liv, AC Narvaez, APJ Effting, P Kruit, ...
Journal of microscopy 252 (1), 58-70, 2013
The system can't perform the operation now. Try again later.
Articles 1–20