| Lithographic apparatus and device manufacturing method JT De Smit, VY Banine, THJ Bisschops, MMTM Dierichs, TM Modderman US Patent 7,684,008, 2010 | 647 | 2010 |
| Lithographic apparatus and device manufacturing method JT De Smit, VY Banine, THJ Bisschops, TM Modderman, MMTM Dierichs US Patent 7,317,504, 2008 | 196 | 2008 |
| Signal integrity analysis system A Alani, T Ngo, P Morrin US Patent App. 10/103,508, 2003 | 170 | 2003 |
| Plasma sources for EUV lithography exposure tools V Banine, R Moors Journal of Physics D: Applied Physics 37 (23), 3207, 2004 | 135 | 2004 |
| First performance results of the ASML alpha demo tool H Meiling, H Meijer, V Banine, R Moors, R Groeneveld, HJ Voorma, ... Emerging Lithographic Technologies X 6151, 49-60, 2006 | 97 | 2006 |
| Extreme ultraviolet lithography: Status and prospects J Benschop, V Banine, S Lok, E Loopstra Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 95 | 2008 |
| Lithographic projection apparatus and particle barrier for use therein LP Bakker, FJP Schuurmans, VY Banine US Patent 6,838,684, 2005 | 78 | 2005 |
| Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap LP Bakker, VY Banine, CPAM Luijkx, FJP Schuurmans US Patent 7,307,263, 2007 | 77 | 2007 |
| Extreme-ultraviolet sources for lithography applications V Banine, J Moors Emerging Lithographic Technologies V 4343, 203-214, 2001 | 75 | 2001 |
| Liquid immersion lithography: Why, how, and when? M Rothschild, TM Bloomstein, RR Kunz, V Liberman, M Switkes, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 73 | 2004 |
| Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby LP Bakker, VY Banine, JHJ Moors, CIMA Spee, JCL Franken, AC Wassink, ... US Patent 7,868,304, 2011 | 72 | 2011 |
| Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window HM Visser, RL Sandstrom, THJ Bisschops, VY Banine, J Jonkers US Patent 6,576,912, 2003 | 69 | 2003 |
| Radiation source for use in lithographic projection apparatus F Bijkerk, H Fiedorowicz, CC De Bruijn, A Bartnik, KN Koshelev, ... US Patent 6,452,194, 2002 | 65 | 2002 |
| Short period La/B and LaN/B multilayer mirrors for~ 6.8 nm wavelength IA Makhotkin, E Zoethout, R van de Kruijs, SN Yakunin, E Louis, ... Optics Express 21 (24), 29894-29904, 2013 | 64 | 2013 |
| Lithographic apparatus having a monitoring device for detecting contamination LHJ Stevens, VY Banine, JHJ Moors, BT Wolschrijn US Patent 7,405,417, 2008 | 64 | 2008 |
| Lithographic apparatus, programmable patterning device and lithographic method PWH De Jager, VY Banine, JPH Benschop, CQ Gui, J Onvlee, ... US Patent 8,531,648, 2013 | 63 | 2013 |
| Development of the ASML EUV alpha demo tool H Meiling, V Banine, N Harned, B Blum, P Kürz, H Meijer Emerging Lithographic Technologies IX 5751, 90-101, 2005 | 59 | 2005 |
| Lithographic projection apparatus, device manufacturing method, and device manufactured thereby NB Koster, BM Mertens, MHA Leenders, VV Ivanov, KN Koshelev, ... US Patent 6,614,505, 2003 | 59 | 2003 |
| Free-standing spectral purity filters for extreme ultraviolet lithography NI Chkhalo, MN Drozdov, EB Kluenkov, AY Lopatin, VI Luchin, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 11 (2), 021115-021115, 2012 | 58 | 2012 |
| Sn etching with hydrogen radicals to clean EUV optics M Van Herpen, DJW Klunder, WA Soer, R Moors, V Banine Chemical Physics Letters 484 (4-6), 197-199, 2010 | 57 | 2010 |
