High performance and highly uniform gate-all-around silicon nanowire MOSFETs with wire size dependent scaling S Bangsaruntip, GM Cohen, A Majumdar, Y Zhang, SU Engelmann, ...
2009 IEEE International Electron Devices Meeting (IEDM), 1-4, 2009
597 2009 Challenges and solutions of FinFET integration in an SRAM cell and a logic circuit for 22 nm node and beyond H Kawasaki, VS Basker, T Yamashita, CH Lin, Y Zhu, J Faltermeier, ...
2009 IEEE international electron devices meeting (IEDM), 1-4, 2009
186 2009 Mronline: Mapreduce online performance tuning M Li, L Zeng, S Meng, J Tan, L Zhang, AR Butt, N Fuller
Proceedings of the 23rd international symposium on High-performance parallel …, 2014
181 2014 Characterization of transformer coupled oxygen plasmas by trace rare gases-optical emission spectroscopy and Langmuir probe analysis NCM Fuller, MV Malyshev, VM Donnelly, IP Herman
Plasma Sources Science and Technology 9 (2), 116, 2000
128 2000 FinFET performance advantage at 22nm: An AC perspective M Guillorn, J Chang, A Bryant, N Fuller, O Dokumaci, X Wang, J Newbury, ...
2008 Symposium on VLSI Technology, 12-13, 2008
123 2008 Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl2 and Cl number densities MV Malyshev, VM Donnelly
Journal of Applied Physics 88 (11), 6207-6215, 2000
114 2000 Effect of plasma interactions with low-κ films as a function of porosity, plasma chemistry, and temperature MA Worsley, SF Bent, SM Gates, N Fuller, W Volksen, M Steen, T Dalton
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
106 2005 Interconnect structures with fully aligned vias DC Edelstein, NC Fuller, EE Huang, SV Nitta, DL Rath
US Patent 9,324,650, 2016
97 2016 Optical actinometry of Cl, and densities in inductively coupled plasmas NCM Fuller, IP Herman, VM Donnelly
Journal of Applied Physics 90 (7), 3182-3191, 2001
92 2001 Demonstration of highly scaled FinFET SRAM cells with high-κ/metal gate and investigation of characteristic variability for the 32 nm node and beyond H Kawasaki, M Khater, M Guillorn, N Fuller, J Chang, S Kanakasabapathy, ...
2008 IEEE International Electron Devices Meeting, 1-4, 2008
77 2008 Systems and methods for building and implementing ontology-based information resources JF Argüello, Y Drissi, NCM Fuller, IM Nnebe, DM Sow
US Patent 7,739,218, 2010
68 2010 Electron temperatures of inductively coupled plasmas NCM Fuller, VM Donnelly, IP Herman
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (1 …, 2002
64 2002 Characterization of neutral species densities in dual frequency capacitively coupled photoresist ash plasmas by optical emission actinometry MA Worsley, SF Bent, NCM Fuller, T Dalton
Journal of applied physics 100 (8), 2006
60 2006 Sub-lithographic dimensioned air gap formation and related structure DC Edelstein, NCM Fuller, DV Horak, EE Huang, W Li, AD Lisi, SV Nitta, ...
US Patent 7,943,480, 2011
50 2011 Optical plasma emission spectroscopy of etching plasmas used in Si-based semiconductor processing VM Donnelly, MV Malyshev, M Schabel, A Kornblit, W Tai, IP Herman, ...
Plasma Sources Science and Technology 11 (3A), A26, 2002
45 2002 Effect of radical species density and ion bombardment during ashing of extreme ultralow-κ interlevel dielectric materials MA Worsley, SF Bent, NCM Fuller, TL Tai, J Doyle, M Rothwell, T Dalton
Journal of applied physics 101 (1), 2007
43 2007 Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly HY Tsai, H Miyazoe, S Engelmann, B To, E Sikorski, J Bucchignano, ...
Journal of Vacuum Science & Technology B 30 (6), 2012
42 2012 Laser-induced fluorescence and Langmuir probe determination of and absolute densities in transformer-coupled chlorine plasmas MV Malyshev, NCM Fuller, KHA Bogart, VM Donnelly, IP Herman
Applied physics letters 74 (12), 1666-1668, 1999
42 1999 The effects of vacuum ultraviolet radiation on low-k dielectric films H Sinha, H Ren, MT Nichols, JL Lauer, M Tomoyasu, NM Russell, G Jiang, ...
Journal of Applied Physics 112 (11), 2012
40 2012 Diagnostics of inductively coupled chlorine plasmas: Measurement of and densities MV Malyshev, NCM Fuller, KHA Bogart, VM Donnelly, IP Herman
Journal of Applied Physics 88 (5), 2246-2251, 2000
40 2000