Standing wave and skin effects in large-area, high-frequency capacitive discharges MA Lieberman, JP Booth, P Chabert, JM Rax, MM Turner
Plasma Sources Science and Technology 11 (3), 283, 2002
386 2002 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerizationG Cunge, JP Booth
Journal of Applied Physics 85 (8), 3952-3959, 1999
223 1999 Oxygen and fluorine atom kinetics in electron cyclotron resonance plasmas by time‐resolved actinometry JP Booth, N Sadeghi
Journal of applied physics 70 (2), 611-620, 1991
200 1991 A novel electrostatic probe method for ion flux measurements NSJ Braithwaite, JP Booth, G Cunge
Plasma Sources Science and Technology 5 (4), 677, 1996
194 1996 radical production and loss in a reactive ion etching plasma: Fluorine rich conditionsJP Booth, G Cunge, P Chabert, N Sadeghi
Journal of Applied Physics 85 (6), 3097-3107, 1999
192 1999 Spatially and temporally resolved laser‐induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma JP Booth, G Hancock, ND Perry, MJ Toogood
Journal of applied physics 66 (11), 5251-5257, 1989
187 1989 Oxygen atom actinometry reinvestigated: Comparison with absolute measurements by resonance absorption at 130 nm JP Booth, O Joubert, J Pelletier, N Sadeghi
Journal of applied physics 69 (2), 618-626, 1991
152 1991 Ion flux nonuniformities in large-area high-frequency capacitive discharges A Perret, P Chabert, JP Booth, J Jolly, J Guillon, P Auvray
Applied physics letters 83 (2), 243-245, 2003
144 2003 Electron beam pulses produced by helicon‐wave excitation AR Ellingboe, RW Boswell, JP Booth, N Sadeghi
Physics of Plasmas 2 (6), 1807-1809, 1995
132 1995 Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms B Bruneau, T Gans, D O’Connell, A Greb, EV Johnson, JP Booth
Physical review letters 114 (12), 125002, 2015
121 2015 Ion energy uniformity in high-frequency capacitive discharges A Perret, P Chabert, J Jolly, JP Booth
Applied Physics Letters 86 (2), 2005
116 2005 Absolute radical densities in etching plasmas determined by broad-band UV absorption spectroscopy JP Booth, G Cunge, F Neuilly, N Sadeghi
Plasma Sources Science and Technology 7 (3), 423, 1998
108 1998 Optical and electrical diagnostics of fluorocarbon plasma etching processes JP Booth
Plasma Sources Science and Technology 8 (2), 249, 1999
106 1999 Electron heating in capacitively coupled plasmas revisited T Lafleur, P Chabert, JP Booth
Plasma Sources Science and Technology 23 (3), 035010, 2014
102 2014 Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring T Lafleur, PA Delattre, EV Johnson, JP Booth
Applied Physics Letters 101 (12), 2012
95 2012 Dual-frequency capacitive radiofrequency discharges: effect of low-frequency power on electron density and ion flux JP Booth, G Curley, D Marić, P Chabert
Plasma Sources Science and Technology 19 (1), 015005, 2009
94 2009 Laser induced fluorescence detection of CF and CF2 radicals in a CF4 /O2 plasma JP Booth, G Hancock, ND Perry
Applied physics letters 50 (6), 318-319, 1987
93 1987 Enhanced sheath heating in capacitively coupled discharges due to non-sinusoidal voltage waveforms T Lafleur, RW Boswell, JP Booth
Applied Physics Letters 100 (19), 2012
92 2012 Overview of JET results for optimising ITER operation J Mailloux, N Abid, K Abraham, P Abreu, O Adabonyan, P Adrich, ...
Nuclear fusion 62 (4), 042026, 2022
86 2022 Secondary electron induced asymmetry in capacitively coupled plasmas T Lafleur, P Chabert, JP Booth
Journal of Physics D: Applied Physics 46 (13), 135201, 2013
82 2013