Anton Haase
Anton Haase
EUV-Radiometry, Physikalisch-Technische Bundesanstalt
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Aligning the band gap of graphene nanoribbons by monomer doping
C Bronner, S Stremlau, M Gille, F Brauße, A Haase, S Hecht, P Tegeder
Angewandte Chemie 125 (16), 4518-4521, 2013
A new 28Si single crystal: counting the atoms for the new kilogram definition
G Bartl, P Becker, B Beckhoff, H Bettin, E Beyer, M Borys, I Busch, L Cibik, ...
Metrologia 54 (5), 693, 2017
Multiparameter characterization of subnanometre Cr/Sc multilayers based on complementary measurements
A Haase, S Bajt, P Hönicke, V Soltwisch, F Scholze
Journal of applied crystallography 49 (6), 2161-2171, 2016
Electronic structure changes during the surface-assisted formation of a graphene nanoribbon
C Bronner, M Utecht, A Haase, P Saalfrank, T Klamroth, P Tegeder
The Journal of chemical physics 140 (2), 024701, 2014
Numerical solutions of the Rayleigh equations for the scattering of light from a two-dimensional randomly rough perfectly conducting surface
T Nordam, PA Letnes, I Simonsen, AA Maradudin
JOSA A 31 (5), 1126-1134, 2014
Correlated diffuse x-ray scattering from periodically nanostructured surfaces
V Soltwisch, A Haase, J Wernecke, J Probst, M Schoengen, S Burger, ...
Physical Review B 94 (3), 035419, 2016
Nanometrology on gratings with GISAXS: FEM reconstruction and fourier analysis
V Soltwisch, J Wernecke, A Haase, J Probst, M Schoengen, M Krumrey, ...
Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014
Reconstructing detailed line profiles of lamellar gratings from GISAXS patterns with a Maxwell solver
V Soltwisch, A Fernández Herrero, M Pflüger, A Haase, J Probst, C Laubis, ...
Journal of Applied Crystallography 50 (5), 1524-1532, 2017
Extended asymmetric-cut multilayer X-ray gratings
M Prasciolu, A Haase, F Scholze, HN Chapman, S Bajt
Optics express 23 (12), 15195-15204, 2015
Interface morphology of Mo/Si multilayer systems with varying Mo layer thickness studied by EUV diffuse scattering
A Haase, V Soltwisch, S Braun, C Laubis, F Scholze
Optics Express 25 (13), 15441-15455, 2017
Determination of line profiles on photomasks using DUV, EUV, and x-ray scattering
F Scholze, B Bodermann, S Burger, J Endres, A Haase, M Krumrey, ...
30th European Mask and Lithography Conference 9231, 92310M, 2014
Update on EUV radiometry at PTB
C Laubis, A Barboutis, C Buchholz, A Fischer, A Haase, F Knorr, ...
Extreme Ultraviolet (EUV) Lithography VII 9776, 977627, 2016
PTB-Mitteilungen 124
F Scholze, A Haase, M Krumrey, V Soltwisch, J Wernecke
Heft 4 (8), 2014
Determination of line profiles on nano-structured surfaces using EUV and x-ray scattering
V Soltwisch, J Wernecke, A Haase, J Probst, M Schoengen, M Krumrey, ...
Photomask Technology 2014 9235, 92351D, 2014
Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering
A Haase, V Soltwisch, F Scholze, S Braun
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V …, 2015
Role of dynamic effects in the characterization of multilayers by means of power spectral density
A Haase, V Soltwisch, C Laubis, F Scholze
Applied Optics 53 (14), 3019-3027, 2014
Investigating surface structures by EUV scattering
V Soltwisch, C Laubis, AF Herrero, M Pflüger, A Haase, F Scholze
Extreme Ultraviolet (EUV) Lithography VIII 10143, 101430P, 2017
Ar beam induced desorption from different materials at TSL
OB Malyshev, B Zajec, A Haase, L Westerberg, M Leandersson, ...
Vacuum 85 (2), 338-343, 2010
Multimethod metrology of multilayer mirrors using EUV and X-Ray radiation
A Haase
PQDT-Global, 2017
Characterization of optical material parameters for EUV Lithography applications at PTB
C Laubis, A Haase, V Soltwisch, F Scholze
31st European Mask and Lithography Conference 9661, 96610W, 2015
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