Muharrem Bayraktar
Muharrem Bayraktar
Assistant Professor, University of Twente
Geverifieerd e-mailadres voor utwente.nl - Homepage
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Geciteerd door
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
F Torretti, J Sheil, R Schupp, MM Basko, M Bayraktar, RA Meijer, S Witte, ...
Nature communications 11 (1), 2334, 2020
Efficient Generation of Extreme Ultraviolet Light From :YAG-Driven Microdroplet-Tin Plasma
R Schupp, F Torretti, RA Meijer, M Bayraktar, J Scheers, D Kurilovich, ...
Physical review applied 12 (1), 014010, 2019
Method to calculate the far field of three-dimensional objects for computer-generated holography
M Bayraktar, M Özcan
Applied Optics 49 (24), 4647-4654, 2010
Extreme ultraviolet light from a tin plasma driven by a 2-µm-wavelength laser
L Behnke, R Schupp, Z Bouza, M Bayraktar, Z Mazzotta, R Meijer, J Sheil, ...
Optics Express 29 (3), 4475-4487, 2021
Radiation transport and scaling of optical depth in Nd: YAG laser-produced microdroplet-tin plasma
R Schupp, F Torretti, RA Meijer, M Bayraktar, J Sheil, J Scheers, ...
Applied physics letters 115 (12), 2019
High-power EUV lithography: spectral purity and imaging performance
M van de Kerkhof, F Liu, M Meeuwissen, X Zhang, M Bayraktar, R de Kruif, ...
Journal of micro/nanolithography, MEMS, and MOEMS 19 (3), 033801-033801, 2020
Digital holography image reconstruction methods
M Özcan, M Bayraktar
SPIE Proceedings, 72330B, 2009
Characterization of 1- and 2-μm-wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light
R Schupp, L Behnke, J Sheil, Z Bouza, M Bayraktar, W Ubachs, ...
Physical Review Research 3, 013294, 2021
Spectral characterization of an industrial EUV light source for nanolithography
F Torretti, F Liu, M Bayraktar, J Scheers, Z Bouza, W Ubachs, R Hoekstra, ...
Journal of Physics D: Applied Physics, 2019
Nanosheet controlled epitaxial growth of PbZr0.52Ti0.48O3 thin films on glass substrates
M Bayraktar, A Chopra, F Bijkerk, G Rijnders
Applied Physics Letters 105 (13), 132904, 2014
Ion‐Selective Ionic Polymer Metal Composite (IPMC) Actuator Based on Crown Ether Containing Sulfonated Poly (Arylene Ether Ketone)
S Tas, B Zoetebier, OS Sukas, M Bayraktar, M Hempenius, GJ Vancso, ...
Macromolecular Materials and Engineering 302 (4), 2017
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets
R Schupp, L Behnke, Z Bouza, Z Mazzotta, Y Mostafa, A Lassise, L Poirier, ...
Journal of Physics D: Applied Physics 54, 365103, 2021
EUV Mirror Arrangement, Optical System Comprising EUV Mirror Arrangement and Method for Operating an Optical System Comprising an EUV Mirror Arrangement
U Dinger, F Bijkerk, M Bayraktar, O Dier
WO Patent 2,012,126,954, 2012
Tuning of large piezoelectric response in nanosheet-buffered lead zirconate titanate films on glass substrates
A Chopra, M Bayraktar, M Nijland, JE Elshof, F Bijkerk, G Rijnders
Scientific Reports 7, 251, 2017
Spectral purification and infrared light recycling in extreme ultraviolet lithography sources
M Bayraktar, FA van Goor, KJ Boller, F Bijkerk
Optics Express 22 (7), 8633-8639, 2014
EUV spectroscopy of Sn5+–Sn10+ ions in an electron beam ion trap and laser-produced plasmas
Z Bouza, J Scheers, A Ryabtsev, R Schupp, L Behnke, C Shah, J Sheil, ...
Journal of Physics B: Atomic, Molecular and Optical Physics 53 (19), 195001, 2020
Broadband transmission grating spectrometer for measuring the emission spectrum of EUV sources
M Bayraktar, HMJ Bastiaens, C Bruineman, B Vratzov, F Bijkerk
NEVAC blad 54, 14-19, 2016
Wavefront correction in the extreme ultraviolet wavelength range using piezoelectric thin films
M Bayraktar, A Chopra, G Rijnders, K Boller, F Bijkerk
Optics Express 22 (25), 30623-30632, 2014
Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths
M Bayraktar, WA Wessels, CJ Lee, FA Goor, G Koster, G Rijnders, ...
Journal of Physics D: Applied physics 45, 494001, 2012
The spectrum of a 1-µm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range
Z Bouza, J Byers, J Scheers, R Schupp, Y Mostafa, L Behnke, Z Mazzotta, ...
AIP Advances 11 (12), 125003, 2021
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