Satoshi Takei
Satoshi Takei
Toyama Prefectural University
Verified email at - Homepage
Cited by
Cited by
One-colour control of activation, excitation and deactivation of a fluorescent diarylethene derivative in super-resolution microscopy
Y Arai, S Ito, H Fujita, Y Yoneda, T Kaji, S Takei, R Kashihara, M Morimoto, ...
Chemical communications 53 (29), 4066-4069, 2017
Resist underlayer film forming composition containing liquid additive
Y Horiguchi, T Shinjo, S Takei
US Patent 8,481,247, 2013
Composition for forming gap-filling material for lithography
S Takei, KI Mizusawa, Y Sone
US Patent 7,517,633, 2009
Silicon-containing spin-on underlayer material for step and flash nanoimprint lithography
S Takei, T Ogawa, R Deschner, K Jen, T Nihira, M Hanabata, CG Willson
Japanese Journal of Applied Physics 49 (7R), 075201, 2010
Eco-friendly electron beam lithography using water-developable resist material derived from biomass
S Takei, A Oshima, T Wakabayashi, T Kozawa, S Tagawa
Applied Physics Letters 101 (3), 2012
Ultraviolet nanoimprint lithography using cyclodextrin-based porous template for pattern failure reduction
S Takei, M Hanabata
Applied Physics Letters 107 (14), 2015
Reduction of pattern peeling in step-and-flash imprint lithography
S Takei, T Ogawa, R Deschner, CG Willson
Microelectronic Engineering 116, 44-50, 2014
Electron beam lithography using highly sensitive negative type of plant-based resist material derived from biomass on hardmask layer
S Takei, A Oshima, A Sekiguchi, N Yanamori, M Kashiwakura, T Kozawa, ...
Applied Physics Express 4 (10), 106502, 2011
Organic solvent-free water-developable sugar resist material derived from biomass in green lithography
S Takei, A Oshima, T Ichikawa, A Sekiguchi, M Kashiwakura, T Kozawa, ...
Microelectronic Engineering 122, 70-76, 2014
Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
S Takei, Y Horiguchi, K Hashimoto, M Nakajima
US Patent 8,048,615, 2011
Study of self cross-link bottom antireflective coating and gap fill materials for sublimate defect reduction in ArF lithography
S Takei, T Shinjo, Y Sakaida
Japanese journal of applied physics 46 (3R), 949, 2007
Composition for forming nitride coating film for hard mask
S Takei, Y Sakaida
US Patent 7,727,902, 2010
Study of high etch rate bottom antireflective coating and gap fill materials using dextrin derivatives in ArF lithography
S Takei, T Shinjo, Y Sakaida
Japanese Journal of Applied Physics 46 (11R), 7279, 2007
Step and flash nano imprint lithography of 80 nm dense line pattern using trehalose derivative resist material
S Takei
Applied physics express 3 (2), 025202, 2010
Developer-soluble gap fill materials for patterning metal trenches in via-first dual damascene process
M Bhave, K Edwards, CA Washburn, S Takei, Y Sakaida, Y Nakajima
Advances in Resist Technology and Processing XXI 5376, 640-647, 2004
Inedible cellulose-based biomass resist material amenable to water-based processing for use in electron beam lithography
S Takei, H Maki, K Sugahara, K Ito, M Hanabata
AIP Advances 5 (7), 2015
Composition for forming resist underlayer film for nanoimprint
S Takei, T Ohashi
US Patent App. 13/386,230, 2012
Ultraviolet nano imprint lithography using fluorinated silicon-based resist materials
S Takei
Applied Physics Express 3 (2), 025203, 2010
Gas‐Permeable Cellulose Template for Reduction of Template Damage and Gas Trapping in Microimprint Lithography of High Volume Manufacturing
S Takei, S Nakajima, K Sugahara, M Hanabata, Y Matsumoto, ...
Macromolecular Materials and Engineering 301 (8), 902-906, 2016
Underlayer coating forming composition for lithography containing compound having protected carboxyl group
S Takei, T Kishioka, Y Sakaida, T Shinjo
US Patent 7,226,721, 2007
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