| Low-noise phase imaging by hybrid uniform and structured illumination transport of intensity equation Y Zhu, A Shanker, L Tian, L Waller, G Barbastathis Optics express 22 (22), 26696-26711, 2014 | 52 | 2014 |
| Transport of intensity phase imaging in the presence of curl effects induced by strongly absorbing photomasks A Shanker, L Tian, M Sczyrba, B Connolly, A Neureuther, L Waller Applied optics 53 (34), J1-J6, 2014 | 33 | 2014 |
| Aberration recovery by imaging a weak diffuser G Gunjala, S Sherwin, A Shanker, L Waller Optics Express 26 (16), 21054-21068, 2018 | 17 | 2018 |
| Critical assessment of the transport of intensity equation as a phase recovery technique in optical lithography A Shanker, M Sczyrba, B Connolly, F Kalk, A Neureuther, L Waller Optical Microlithography XXVII 9052, 401-410, 2014 | 15 | 2014 |
| Absorber topography dependence of phase edge effects A Shanker, M Sczyrba, B Connolly, L Waller, A Neureuther Photomask Technology 2015 9635, 104-113, 2015 | 9 | 2015 |
| Optical transfer function characterization using a weak diffuser G Gunjala, A Shanker, V Jaedicke, N Antipa, L Waller Three-Dimensional and Multidimensional Microscopy: Image Acquisition and …, 2016 | 8 | 2016 |
| Extreme ultraviolet microscope characterization using photomask surface roughness G Gunjala, A Wojdyla, S Sherwin, A Shanker, MP Benk, KA Goldberg, ... Scientific reports 10 (1), 11673, 2020 | 6 | 2020 |
| Defocus-based quantitative phase imaging by coded illumination A Shanker, L Tian, L Waller Three-Dimensional and Multidimensional Microscopy: Image Acquisition and …, 2014 | 6 | 2014 |
| Characterizing the dependence of thick-mask edge effects on illumination angle using AIMS images A Shanker, M Sczyrba, F Lange, B Connolly, AR Neureuther, L Waller Optical Microlithography XXVIII 9426, 178-185, 2015 | 5 | 2015 |
| Defocus based phase imaging for quantifying electromagnetic edge effects in photomasks A Shanker, L Waller, AR Neureuther Master’s thesis (University of California, 2014), 2014 | 5 | 2014 |
| Analysis of edge effects in attenuating phase-shift masks using quantitative phase imaging A Shanker, M Sczyrba, B Connolly, A Neureuther, L Waller Photomask Technology 2013 8880, 352-363, 2013 | 5 | 2013 |
| Off-axis aberration estimation in an EUV microscope using natural speckle A Shanker, A Wojdyla, G Gunjala, J Dong, M Benk, A Neureuther, ... Imaging Systems and Applications, ITh1F. 2, 2016 | 4 | 2016 |
| Recovering curl using an iterative solver for the transport of intensity equation A Shanker, L Tian, M Sczyrba, B Connolly, A Neureuther, L Waller Imaging Systems and Applications, ITh2A. 5, 2015 | 2 | 2015 |
| Quantitative Phase Imaging with a Metalens A Shanker, J Froech, S Mukherjee, M Zhelyeznyakov, E Seibel, ... arXiv preprint arXiv:2309.11348, 2023 | 1 | 2023 |
| Partially Coherent Double-Phase Holography in Visible Wavelength Using Meta-Optics S Mukherjee, QAA Tanguy, JE Fröch, A Shanker, KF Böhringer, ... ACS Photonics 10 (5), 1376-1381, 2023 | 1 | 2023 |
| Speckle metrology for extreme ultra-violet lithography A Shanker, L Waller, G Gunjala, A Wojdyla, D Voronov, P Naulleau Extreme Ultraviolet (EUV) Lithography IX 10583, 206-214, 2018 | 1 | 2018 |
| Differential methods for phase imaging in optical lithography A Shanker University of California, Berkeley, 2018 | 1 | 2018 |
| Universal principles of intelligent system design K Popov, A Shanker, D Bhowmik Cosmos and History: The Journal of Natural and Social Philosophy 14 (1), 113-123, 2018 | 1 | 2018 |
| EUV mask roughness can recover litho-tool aberrations (Conference Presentation) A Shanker, L Waller, A Wojdyla, MP Benk, KA Goldberg, PP Naulleau International Conference on Extreme Ultraviolet Lithography 2017 10450, 104500S, 2017 | 1 | 2017 |
| X-ray phase imaging and computed tomography with sandpaper analyzer Y Hu, M Chen, LH Yeh, D Parkinson, A Shanker, A MacDowell, L Waller Computational Optical Sensing and Imaging, CM3E. 6, 2015 | 1 | 2015 |
