Fatemeh S. M. Hashemi
Fatemeh S. M. Hashemi
TNO, University of Amsterdam
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Photoenhanced Degradation of Methylene Blue on Cosputtered M:TiO2 (M = Au, Ag, Cu) Nanocomposite Systems: A Comparative Study
P Sangpour, F Hashemi, AZ Moshfegh
The Journal of Physical Chemistry C 114 (33), 13955-13961, 2010
Self-correcting process for high quality patterning by atomic layer deposition
FS Minaye Hashemi, C Prasittichai, SF Bent
Acs Nano 9 (9), 8710-8717, 2015
A new resist for area selective atomic and molecular layer deposition on metal–dielectric patterns
FSM Hashemi, C Prasittichai, SF Bent
The Journal of Physical Chemistry C 118 (20), 10957-10962, 2014
Selective Deposition of Dielectrics: Limits and Advantages of Alkanethiol Blocking Agents on Metal–Dielectric Patterns
FS Minaye Hashemi, BR Birchansky, SF Bent
ACS applied materials & interfaces 8 (48), 33264-33272, 2016
A process for topographically selective deposition on 3D nanostructures by ion implantation
WH Kim, FS Minaye Hashemi, AJM Mackus, J Singh, Y Kim, ...
ACS nano 10 (4), 4451-4458, 2016
Sequential Regeneration of Self‐Assembled Monolayers for Highly Selective Atomic Layer Deposition
FSM Hashemi, SF Bent
Advanced Materials Interfaces 3 (21), 1600464, 2016
Improving area-selective molecular layer deposition by selective SAM removal
C Prasittichai, KL Pickrahn, FS Minaye Hashemi, DS Bergsman, SF Bent
ACS Applied Materials & Interfaces 6 (20), 17831-17836, 2014
Dye metachromasy on titanate nanowires: sensing humidity with reversible molecular dimerization
E Horváth, PR Ribič, F Hashemi, L Forró, A Magrez
Journal of Materials Chemistry 22 (18), 8778-8784, 2012
Effects of surface oxide formation on germanium nanowire band-edge photoluminescence
FS Minaye Hashemi, S Thombare, AF Morral, ML Brongersma, ...
Applied Physics Letters 102 (25), 251122, 2013
Correcting defects in area selective molecular layer deposition
RG Closser, DS Bergsman, L Ruelas, FSM Hashemi, SF Bent
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 35 (3 …, 2017
ACS Nano 9, 8710 (2015)
FSM Hashemi, C Prasittichai, SF Bent
Atomic layer deposition of ZnO on InP quantum dot films for charge separation, stabilization, and solar cell formation
RW Crisp, FSM Hashemi, J Alkemade, N Kirkwood, G Grimaldi, S Kinge, ...
Advanced Materials Interfaces 7 (4), 1901600, 2020
ACS Nano 10, 4451 (2016)
WH Kim, FSM Hashemi, AJM Mackus, J Singh, Y Kim, DB Semple, Y Fan, ...
Thermal atomic layer deposition of gold nanoparticles: controlled growth and size selection for photocatalysis
FSM Hashemi, F Grillo, VR Ravikumar, D Benz, A Shekhar, MBE Griffiths, ...
Nanoscale 12 (16), 9005-9013, 2020
Aluminum tri-isopropoxide as an alternative precursor for atomic layer deposition of aluminum oxide thin films
F Hashemi, LA Cao, F Mattelaer, T Sajavaara, JR van Ommen, ...
Journal of Vacuum Science & Technology A 37, 04901, 2019
Atomic Layer Deposition of Al2O3 Using Aluminum Triisopropoxide (ATIP): A Combined Experimental and Theoretical Study
TB Tai, LA Cao, F Mattelaer, G Rampelberg, FSM Hashemi, J Dendooven, ...
The Journal of Physical Chemistry C 123 (1), 485-494, 2018
Rheological response of a modified polyacrylamide–silica nanoparticles hybrid at high salinity and temperature
MM Yegane, F Hashemi, F Vercauteren, N Meulendijks, R Gharbi, ...
Soft Matter 16 (44), 10198-10210, 2020
Area selective atomic layer deposition of metal oxides on metal-dielectric patterns
FS Minaye Hashemi
Stanford University, 2016
Passivation of ultrathin polysilicon via a simple one-step deposition method for large-area crystalline silicon solar cells
FS Minaye Hashemi, A Gutjahr, J Anker, AA Mewe
Poster EUPVSEC 2021, 1, 2021
Metal Oxide Infilling of Quantum Dot Thin Films: Increased Stability and Carrier Mobility for Device Applications
FSM Hashemi, RW Crisp, J Alkemade, AJ Houtepen, JR Van Ommen
2018 AIChE Annual Meeting, 2018
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Articles 1–20