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Daniel Fan
Daniel Fan
Geverifieerd e-mailadres voor unimelb.edu.au
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Engineered 3D polymer and hydrogel microenvironments for cell culture applications
D Fan, U Staufer, A Accardo
Bioengineering 6 (4), 113, 2019
732019
Photolithography reaches 6 nm half-pitch using extreme ultraviolet light
D Fan, Y Ekinci
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033505-033505, 2016
60*2016
Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths
N Mojarad, D Fan, J Gobrecht, Y Ekinci
Optics Letters 39 (8), 2286-2289, 2014
482014
SnOx high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography
E Buitrago, R Fallica, D Fan, TS Kulmala, M Vockenhuber, Y Ekinci
Microelectronic Engineering 155, 44-49, 2016
422016
Strain and thermal conductivity in ultrathin suspended silicon nanowires
D Fan, H Sigg, R Spolenak, Y Ekinci
Physical Review B 96 (11), 115307, 2017
392017
Effect of the pn junction engineering on Si microwire‐array solar cells
A Dalmau Mallorquí, FM Epple, D Fan, O Demichel, ...
physica status solidi (a) 209 (8), 1588-1591, 2012
332012
Nickel electroplating for high-resolution nanostructures
K Hili, D Fan, VA Guzenko, Y Ekinci
Microelectronic Engineering 141, 122-128, 2015
322015
Emergent collective organization of bone cells in complex curvature fields
SJP Callens, D Fan, IAJ van Hengel, M Minneboo, PJ Díaz-Payno, ...
Nature Communications 14 (1), 855, 2023
292023
3D printing of large areas of highly ordered submicron patterns for modulating cell behavior
M Nouri-Goushki, MJ Mirzaali, L Angeloni, D Fan, M Minneboo, ...
ACS applied materials & interfaces 12 (1), 200-208, 2019
272019
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility
D Fan, E Buitrago, S Yang, W Karim, Y Wu, R Tai, Y Ekinci
Microelectronic Engineering 155, 55-60, 2016
232016
Fabrication of a microfluidic device by using two-photon lithography on a positive photoresist
G van der Velden, D Fan, U Staufer
Micro and Nano Engineering 7, 100054, 2020
222020
Evidence for carbon clusters present near thermal gate oxides affecting the electronic band structure in SiC-MOSFET
D Dutta, DS De, D Fan, S Roy, G Alfieri, M Camarda, M Amsler, ...
Applied Physics Letters 115 (10), 2019
212019
Fabrication of ultrahigh resolution metal nanowires and nanodots through EUV interference lithography
J Huang, D Fan, Y Ekinci, C Padeste
Microelectronic Engineering 141, 32-36, 2015
192015
Nanolithography using Bessel beams of extreme ultraviolet wavelength
D Fan, L Wang, Y Ekinci
Scientific reports 6 (1), 31301, 2016
162016
All-dielectric metasurface-based roll-angle sensor
X Chen, Z Tao, C Chen, C Wang, L Wang, H Jiang, D Fan, Y Ekinci, S Liu
Sensors and Actuators A: Physical 279, 509-517, 2018
152018
EUV resists towards 11nm half-pitch
Y Ekinci, M Vockenhuber, N Mojarad, D Fan
Extreme Ultraviolet (EUV) Lithography V 9048, 904804, 2014
152014
Facile fabrication of high-resolution extreme ultraviolet interference lithography grating masks using footing strategy during electron beam writing
L Wang, D Fan, VA Guzenko, Y Ekinci
Journal of Vacuum Science & Technology B 31 (6), 2013
102013
SOLEIL: single-objective lens inclined light sheet localization microscopy
ST Hung, J Cnossen, D Fan, M Siemons, D Jurriens, K Grußmayer, ...
Biomedical Optics Express 13 (6), 3275-3294, 2022
92022
Theoretical minimum uncertainty of single-molecule localizations using a single-photon avalanche diode array
Q Houwink, D Kalisvaart, ST Hung, J Cnossen, D Fan, P Mos, AC Ülkü, ...
Optics Express 29 (24), 39920-39929, 2021
72021
From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer …
E Buitrago, R Fallica, D Fan, W Karim, M Vockenhuber, JA van Bokhoven, ...
UV and Higher Energy Photonics: From Materials to Applications 9926, 59-70, 2016
52016
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Artikelen 1–20