| Ionized physical vapor deposition (IPVD): A review of technology and applications U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ... Thin solid films 513 (1-2), 1-24, 2006 | 1220 | 2006 |
| High power impulse magnetron sputtering discharge JT Gudmundsson, N Brenning, D Lundin, U Helmersson Journal of vacuum science & technology A 30 (3), 2012 | 701 | 2012 |
| On the film density using high power impulse magnetron sputtering M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ... Surface and Coatings Technology 205 (2), 591-596, 2010 | 395 | 2010 |
| The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ... Thin Solid Films 515 (4), 1522-1526, 2006 | 357 | 2006 |
| Oxygen discharges diluted with argon: dissociation processes JT Gudmundsson, EG Thorsteinsson Plasma Sources Science and Technology 16 (2), 399, 2007 | 312 | 2007 |
| Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces J Alami, POÅ Persson, D Music, JT Gudmundsson, J Bohlmark, ... Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 23 (2 …, 2005 | 298 | 2005 |
| Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson Surface and Coatings Technology 161 (2-3), 249-256, 2002 | 263 | 2002 |
| The low pressure Cl/O discharge and the role of ClO EGTJT Gudmundsson Plasma Sources Science and Technology 19 (5), 055008, 2010 | 250* | 2010 |
| Electronegativity of low-pressure high-density oxygen discharges JT Gudmundsson, IG Kouznetsov, KK Patel, MA Lieberman Journal of Physics D: Applied Physics 34 (7), 1100, 2001 | 239 | 2001 |
| Physics and technology of magnetron sputtering discharges JT Gudmundsson Plasma Sources Science and Technology 29 (11), 113001, 2020 | 201 | 2020 |
| On the effect of the electron energy distribution on the plasma parameters of an argon discharge: a global (volume-averaged) model study JT Gudmundsson Plasma Sources Science and Technology 10 (1), 76, 2001 | 198 | 2001 |
| Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson Applied Physics Letters 78 (22), 3427-3429, 2001 | 177 | 2001 |
| Experimental studies of O2/Ar plasma in a planar inductive discharge JT Gudmundsson, T Kimura, MA Lieberman Plasma Sources Science and Technology 8 (1), 22, 1999 | 150 | 1999 |
| Spatial electron density distribution in a high-power pulsed magnetron discharge J Bohlmark, JT Gudmundsson, J Alami, M Latteman, U Helmersson IEEE Transactions on Plasma Science 33 (2), 346-347, 2005 | 146 | 2005 |
| Improved volume-averaged model for steady and pulsed-power electronegative discharges S Kim, MA Lieberman, AJ Lichtenberg, JT Gudmundsson Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 24 (6 …, 2006 | 143 | 2006 |
| Plasma dynamics in a highly ionized pulsed magnetron discharge J Alami, JT Gudmundsson, J Bohlmark, J Birch, U Helmersson Plasma Sources Science and Technology 14 (3), 525, 2005 | 138 | 2005 |
| The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool JT Gudmundsson Vacuum 84 (12), 1360-1364, 2010 | 130 | 2010 |
| An ionization region model for high-power impulse magnetron sputtering discharges MA Raadu, I Axnäs, JT Gudmundsson, C Huo, N Brenning Plasma Sources Science and Technology 20 (6), 065007, 2011 | 119 | 2011 |
| Recombination and detachment in oxygen discharges: the role of metastable oxygen molecules JT Gudmundsson Journal of Physics D: Applied Physics 37 (15), 2073, 2004 | 118 | 2004 |
| Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses C Huo, MA Raadu, D Lundin, JT Gudmundsson, A Anders, N Brenning Plasma Sources Science and Technology 21 (4), 045004, 2012 | 116 | 2012 |
