Follow
Jon Tomas Gudmundsson
Jon Tomas Gudmundsson
Verified email at hi.is - Homepage
Title
Cited by
Cited by
Year
Ionized physical vapor deposition (IPVD): A review of technology and applications
U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ...
Thin solid films 513 (1-2), 1-24, 2006
13382006
High power impulse magnetron sputtering discharge
JT Gudmundsson, N Brenning, D Lundin, U Helmersson
Journal of Vacuum Science & Technology A 30 (3), 2012
7512012
On the film density using high power impulse magnetron sputtering
M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ...
Surface and Coatings Technology 205 (2), 591-596, 2010
4522010
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ...
Thin Solid Films 515 (4), 1522-1526, 2006
3792006
Physics and technology of magnetron sputtering discharges
JT Gudmundsson
Plasma Sources Science and Technology 29 (11), 113001, 2020
3432020
Oxygen discharges diluted with argon: dissociation processes
JT Gudmundsson, EG Thorsteinsson
Plasma Sources Science and Technology 16 (2), 399, 2007
3152007
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces
J Alami, PO Persson, D Music, JT Gudmundsson, J Bohlmark, ...
Journal of Vacuum Science & Technology A 23 (2), 278-280, 2005
3012005
Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge
JT Gudmundsson, J Alami, U Helmersson
Surface and Coatings Technology 161 (2-3), 249-256, 2002
2742002
Electronegativity of low-pressure high-density oxygen discharges
JT Gudmundsson, IG Kouznetsov, KK Patel, MA Lieberman
Journal of Physics D: Applied Physics 34 (7), 1100, 2001
2462001
The low pressure Cl/O discharge and the role of ClO
EGTJT Gudmundsson
Plasma Sources Science and Technology 19 (5), 055008, 2010
236*2010
On the effect of the electron energy distribution on the plasma parameters of an argon discharge: a global (volume-averaged) model study
JT Gudmundsson
Plasma Sources Science and Technology 10 (1), 76, 2001
1982001
Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge
JT Gudmundsson, J Alami, U Helmersson
Applied Physics Letters 78 (22), 3427-3429, 2001
1822001
Variable sensitivity of plant communities in Iceland to experimental warming
IS Jónsdóttir, B Magnusson, J Gudmundsson, A Elmarsdottir, H Hjartarson
Global Change Biology 11 (4), 553-563, 2005
1772005
Organic carbon in Icelandic Andosols: geographical variation and impact of erosion
H Óskarsson, Ó Arnalds, J Gudmundsson, G Gudbergsson
Catena 56 (1-3), 225-238, 2004
1662004
Improved volume-averaged model for steady and pulsed-power electronegative discharges
S Kim, MA Lieberman, AJ Lichtenberg, JT Gudmundsson
Journal of Vacuum Science & Technology A 24 (6), 2025-2040, 2006
1532006
Spatial electron density distribution in a high-power pulsed magnetron discharge
J Bohlmark, JT Gudmundsson, J Alami, M Latteman, U Helmersson
IEEE Transactions on Plasma Science 33 (2), 346-347, 2005
1502005
Experimental studies of O2/Ar plasma in a planar inductive discharge
JT Gudmundsson, T Kimura, MA Lieberman
Plasma Sources Science and Technology 8 (1), 22, 1999
1451999
The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool
JT Gudmundsson
Vacuum 84 (12), 1360-1364, 2010
1392010
Plasma dynamics in a highly ionized pulsed magnetron discharge
J Alami, JT Gudmundsson, J Bohlmark, J Birch, U Helmersson
Plasma Sources Science and Technology 14 (3), 525, 2005
1352005
An ionization region model for high-power impulse magnetron sputtering discharges
MA Raadu, I Axnäs, JT Gudmundsson, C Huo, N Brenning
Plasma Sources Science and Technology 20 (6), 065007, 2011
1222011
The system can't perform the operation now. Try again later.
Articles 1–20