C. Grant Willson
C. Grant Willson
Professor University of Texas IBM
Verified email at
Cited by
Cited by
New approaches to nanofabrication: molding, printing, and other techniques
BD Gates, Q Xu, M Stewart, D Ryan, CG Willson, GM Whitesides
Chemical reviews 105 (4), 1171-1196, 2005
An introduction to lithography
LF Thompson
Step and flash imprint lithography: a new approach to high-resolution patterning
M Colburn, SC Johnson, MD Stewart, S Damle, TC Bailey, B Choi, ...
Emerging Lithographic Technologies III 3676, 379-389, 1999
Positive-and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
H Ito, CG Willson, JMJ Frechet
US Patent 4,491,628, 1985
Chemical amplification in the design of dry developing resist materials
H Ito, CG Willson
Polymer Engineering & Science 23 (18), 1012-1018, 1983
Block copolymer lithography
CM Bates, MJ Maher, DW Janes, CJ Ellison, CG Willson
Macromolecules 47 (1), 2-12, 2014
Step and flash imprint lithography
CG Willson, ME Colburn
US Patent 6,334,960, 2002
High-throughput sequencing of the paired human immunoglobulin heavy and light chain repertoire
BJ DeKosky, GC Ippolito, RP Deschner, JJ Lavinder, Y Wine, ...
Nature biotechnology 31 (2), 166-169, 2013
Step and flash imprint lithography: Template surface treatment and defect analysis
T Bailey, BJ Choi, M Colburn, M Meissl, S Shaya, JG Ekerdt, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
Polarity-switching top coats enable orientation of sub–10-nm block copolymer domains
CM Bates, T Seshimo, MJ Maher, WJ Durand, JD Cushen, LM Dean, ...
Science 338 (6108), 775-779, 2012
Template for room temperature, low pressure micro-and nano-imprint lithography
T Bailey, BJ Choi, M Colburn, SV Sreenivasan, CG Willson, J Ekerdt
US Patent 6,696,220, 2004
Novel second‐order nonlinear optical polymers via chemical cross‐linking‐induced vitrification under electric field
M Eich, B Reck, DY Yoon, CG Willson, GC Bjorklund
Journal of applied Physics 66 (7), 3241-3247, 1989
Poly (p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins
JMJ Frechet, E Eichler, H Ito, CG Willson
Polymer 24 (8), 995-1000, 1983
Chemical amplification in high-resolution imaging systems
SA MacDonald, CG Willson, JMJ Frechet
Accounts of Chemical Research 27 (6), 151-158, 1994
Electrochromic and optical waveguide studies of corona-poled electro-optic polymer films
RH Page, MC Jurich, B Reck, A Sen, RJ Twieg, JD Swalen, GC Bjorklund, ...
JOSA B 7 (7), 1239-1250, 1990
Method for imprint lithography using an electric field
SV Sreenivasan, RT Bonnecaze, CG Willson
US Patent 6,908,861, 2005
Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications
JD Cushen, I Otsuka, CM Bates, S Halila, S Fort, C Rochas, JA Easley, ...
ACS nano 6 (4), 3424-3433, 2012
Highly efficient and stable nonlinear optical polymers via chemical cross‐linking under electric field
D Jungbauer, B Reck, R Twieg, DY Yoon, CG Willson, JD Swalen
Applied Physics Letters 56 (26), 2610-2612, 1990
Airborne chemical contamination of a chemically amplified resist
SA MacDonald, NJ Clecak, HR Wendt, CG Willson, CD Snyder, CJ Knors, ...
Advances in Resist Technology and Processing VIII 1466, 2-12, 1991
Approaches to the Design of Radiation‐Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution
CG Willson, H Ito, JMJ Fréchet, TG Tessier, FM Houlihan
Journal of the Electrochemical Society 133 (1), 181, 1986
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